Use of the “4th state” exotic process doubles the speed at which the NAND 3D can be produced


  • Researchers find a faster way to engrave deep holes for 3D Nand
  • Plasma cryo-waxing technique doubles the engraving speed, improving the efficiency
  • Faster engraving could Cheaper storage, but the impact of the real world is TBD

The Flash Nand 3D memory is different from the traditional Nand with a single layer because it stacks the memory cells vertically to pile up more storage in smaller areas.

The process is to sculpt deep and deep holes in alternate layers of silicon oxide and silicon nitride, and this has always been a little slow, so far.

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